1 / 12Chia Calming Sunscreen : Ingredients & Skin Analysis.
Strong initial broad-spectrum UV protection
Skin Type Match
Unsuitable · Irritating · Fragrance-Free
- High SPF protection
- Completely fragrance free
- Broad spectrum coverage
- Endocrine disruption risk
- Severe eye stinging
- Not water resistant
Performance Scores
SPF Level
Excellent
SPF Level
The SPF 50 claim is backed by the presence of four distinct UVB-absorbing and broad-spectrum filters positioned prominently in the upper half of the ingredient list.
Broad Spectrum
Excellent
Broad Spectrum
Bisoctrizole (peak 360 nm) and Avobenzone (peak 357 nm) provide extensive UVA I coverage, while Ecamsule (peak 344 nm) thoroughly bridges the UVA II gap.
Sweat Resistance
Poor
Sweat Resistance
Ingredients like Ammonium Acryloyldimethyltaurate/VP Copolymer and Sodium Polyacrylate provide structural viscosity but are water-dispersible and not specialized water-proofing polymers.
Photo Stability
Poor
Photo Stability
Photobiology literature establishes that Avobenzone and Octinoxate undergo rapid photo-induced cycloaddition when combined, degrading UVA and UVB efficacy unless aggressively stabilized by high concentrations of quenchers.
Visible Light
Poor
Visible Light
An exhaustive scan of the ingredient list reveals zero iron oxide color indices or pigmentary-grade non-white minerals.
Irritation Risk
High Risk
Irritation Risk
Propylene glycol is a recognized contact allergen and penetrant enhancer, which combined with chemical UV filters, significantly increases the risk of irritant and allergic contact dermatitis.
Pore Clogging
Medium Risk
Pore Clogging
Established clinical comedogenicity research demonstrates that while cetearyl alcohol and ceteareth-20 are mildly comedogenic individually (1-2/5), their combination exhibits significantly higher pore-clogging potential (rated up to 4/5).
White Cast
Low Risk
White Cast
Bisoctrizole is an organic particulate UV filter that scatters visible light similarly to titanium dioxide, resulting in mild reflectance (Photodermatol Photoimmunol Photomed).
Ingredients Analysis
Active Filters
Avobenzone UVA I / UVA II
Rapidly degrades under UV exposure losing significant UVA protection capacity unless stabilized by other filters.
Ensulizole UVB
In vitro studies suggest it can generate reactive oxygen species upon UV exposure which may lead to cellular damage though real world impact is debated.
Octinoxate UVB
Studies indicate potential estrogenic and thyroid disrupting activity in animal models and human cell lines.
Octisalate UVB
Clinical trials demonstrate systemic absorption into the bloodstream exceeding the FDA threshold requiring further safety testing.
Key Inactive Ingredients
Propylene Glycol Solvent
Recognized as a frequent cause of allergic contact dermatitis especially in individuals with eczema or compromised skin barriers.
Triethanolamine pH Adjuster
May react with nitrosating agents in formulations to form nitrosamines which are potential carcinogens.
Decyl Glucoside Surfactant
Named Contact Allergen of the Year in 2017 due to increasing reports of allergic contact dermatitis, though it remains safe and mild for the vast majority of users.
Cetearyl Alcohol Emollient
Historically rated as mildly comedogenic in animal models but modern dermatological consensus indicates it is unlikely to clog pores in typical cosmetic formulations.
Ceteareth-20 Emulsifier
As an ethoxylated compound, it may contain trace amounts of 1,4 dioxane and ethylene oxide, which are potential carcinogens formed during the manufacturing process.
Phenoxyethanol Preservative
Generally well tolerated but can cause contact dermatitis or skin irritation in rare cases, particularly in sensitive individuals.
Ethylhexylglycerin Preservative
Recognized as a rare but emerging cause of allergic contact dermatitis, particularly in leave-on cosmetic products.